• DocumentCode
    1863045
  • Title

    Micro-Raman scattering study of strain induced by compositional variation in single crystalline Si1-xGex discs

  • Author

    Islam, M.R. ; Yamada, M.

  • Author_Institution
    Dept. of Electron. & Information Sci., Kyoto Inst. of Technol., Japan
  • fYear
    2003
  • fDate
    25-27 Aug. 2003
  • Firstpage
    78
  • Lastpage
    83
  • Abstract
    Micro-Raman scattering (MRS) study has been made to investigate residual strain in single crystalline Si1-xGex discs. It is found that the residual strain is induced by the compositional variation along the radial direction of disc sample, although there is no strain when the composition is uniform over the disc sample. It is also found that the induced strain is relaxed near the edge of disc sample. The residual strain value is evaluated to be of the order of 10-3 for the parabolic-like variation of composition ranged from 0.112 at the center to the 0.143 at the edge of the disc sample.
  • Keywords
    Ge-Si alloys; Raman spectra; internal stresses; semiconductor materials; Si1-xGex; compositional variation induced strain; microRaman scattering; residual strain; single crystalline discs; Capacitive sensors; Crystallization; Laser modes; Lattices; Lenses; Optical scattering; Phonons; Raman scattering; Strain measurement; Tail;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Compound Semiconductors: Post-Conference Proceedings, 2003 International Symposium on
  • Print_ISBN
    0-7803-8614-0
  • Type

    conf

  • DOI
    10.1109/ISCSPC.2003.1354435
  • Filename
    1354435