Title :
Design of 1.2 GeV synchrotron light source for X-ray lithography at Samsung Heavy Industries
Author :
Kim, Keeman ; Han, Bumsoo ; Joh, Kihun ; Kim, Sungmyun ; Kim, Byungmun ; Park, Heunggyu ; Park, Jongpil ; Kim, Jinsoo ; Kang, Wongu ; Kang, Kyungwoo ; Kim, Yuri ; Lee, Sangil ; Kim, Younghee
Author_Institution :
Samsung Heavy Ind. Daeduk R&D Center, Daejoen, South Korea
Abstract :
An 1.2 GeV electron storage ring being designed at Samsung Heavy Industries Daeduk R&D Center is optimized for X-ray lithography works for high density semiconductor devices and micro-machining. The lattice is a variation of a FODO arrangement with four quadrupole doublets. The circumference of 57.6 m includes four 2.1-m-long straight sections and two 3.09-m-long dispersion-free straight sections making the synchrotron a racetrack shape. Two dispersion-free straight sections are located between the doublets and reserved for diagnostics and insertion devices. The harmonic number is 96 and the corresponding RF frequency is 449.654 MHz. The critical X-ray wavelength from sixteen 1.16-m-long bending magnets is 9.55 Å and a superconducting wiggler is also included in the design considerations. The major features of the light source will be described
Keywords :
electron accelerators; lithography; semiconductor technology; storage rings; 1.16 m; 1.2 GeV; 2.1 m; 3.09 m; 499.654 MHz; 9.55 A; FODO lattice; RF frequency; Samsung Heavy Industries; X-ray lithography; X-ray wavelength; electron storage ring; harmonic number; quadrupole doublets; superconducting wiggler; synchrotron light source; Design optimization; Electrons; Lattices; Light sources; Radio frequency; Semiconductor devices; Shape; Storage rings; Synchrotrons; X-ray lithography;
Conference_Titel :
Particle Accelerator Conference, 1995., Proceedings of the 1995
Conference_Location :
Dallas, TX
Print_ISBN :
0-7803-2934-1
DOI :
10.1109/PAC.1995.504632
