Title :
Low-k BCB passivated Al/sub 0.5/Ga/sub 0.5/As/In/sub 0.15/Ga/sub 0.85/As enhancement-mode pHEMTs
Author :
Hsien-Chin Chiu ; Shih-Cheng Yang ; Yi-Jen Chan
Author_Institution :
Dept. of Electr. Eng., Nat. Central Univ., Chungli, Taiwan
Abstract :
A high power-added efficiency Al/sub 0.5/Ga/sub 0.5/As/InGaAs enhancement-mode pHEMTs with benzocyclobutene (BCB) passivated layer are fabricated and characterized. This passivation technology takes advantages of the low dielectric permittivity (2.7) and a low loss tangent (0.0008), which simplifies the passivation process for microwave power device. In this work, we not only suppress the drain-source breakdown voltage but also improve the device power performance under a high input power swing by using a BCB passivation layer. The passivated 1.0 /spl mu/m-long gate pHEMTs exhibit a higher off-state performance than unpassivated ones. The maximum output power under a 2.4 GHz operation is 118 mW/mm, with a linear power gain of 11.1 dB, and a power-added efficiency of 60%. These characteristics demonstrate a great potential for BCB passivated E-mode pHEMTs on the large-signal microwave power device applications.
Keywords :
III-V semiconductors; aluminium compounds; dielectric losses; gallium arsenide; indium compounds; microwave field effect transistors; microwave power transistors; organic compounds; passivation; permittivity; power HEMT; semiconductor device breakdown; 1.0 micron; 11.1 dB; 2.4 GHz; 60 percent; Al/sub 0.5/Ga/sub 0.5/As-In/sub 0.15/Ga/sub 0.85/As; Al/sub 0.5/Ga/sub 0.5/As/In/sub 0.15/Ga/sub 0.85/As enhancement-mode pHEMT; dielectric permittivity; drain-source breakdown voltage; large-signal microwave power device; linear power gain; loss tangent; low-k BCB passivation; output power; power-added efficiency; Dielectric devices; Dielectric losses; Gain; Indium gallium arsenide; Microwave devices; Microwave technology; PHEMTs; Passivation; Permittivity; Power generation;
Conference_Titel :
Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 2001. 23rd Annual Technical Digest
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
0-7803-6663-8
DOI :
10.1109/GAAS.2001.964392