• DocumentCode
    1866343
  • Title

    Simulation of a plasma-focused electron gun

  • Author

    Varboncoeur, J.P.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
  • fYear
    1997
  • fDate
    19-22 May 1997
  • Firstpage
    195
  • Abstract
    Summary form only given. Plasma can play an important role in the physics of an electron gun. It can provide an important focusing mechanism, and plasmas are often present in varying densities in many devices designed for vacuum operation. Plasma can also be a source of noise and instability for a microwave beam device. A plasma-focused electron gun is modeled using the PIC code XOOPIC. The plasma is formed via electron impact ionization with an argon background gas at 10/sup -4/ Torr. Electron-neutral interactions are included using a Monte-Carlo model. The gun operates close to the space charge limit, with V=30 kV, I=9A for a 7 mm AK gap. A solenoidal coil with an iron core provides a peak field on axis of B/sub max/=180 G. Argon ions streaming back toward the cathode cause erosion of the surface. Most of the ion flux passes through a 1 mm hole in the center of the cathode. The flux at the cathode surface is characterized, including energy and angle of incidence. In addition, the beam emittance is examined as the plasma builds up to steady state over a microsecond timescale.
  • Keywords
    Monte Carlo methods; electron beam focusing; electron guns; electron optics; microwave tubes; plasma applications; 0.1 mtorr; 180 G; 30 kV; 7 mm; 9 A; Ar; Monte-Carlo model; PIC code; XOOPIC; argon background gas; beam emittance; electron impact ionization; electron-neutral interactions; focusing mechanism; instability; ion flux; microwave beam device; noise; plasma-focused electron gun; solenoidal coil; Argon; Cathodes; Electrons; Microwave devices; Particle beams; Physics; Plasma density; Plasma devices; Plasma simulation; Plasma sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3990-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.1997.604804
  • Filename
    604804