DocumentCode
1869894
Title
2-photon 3-D lithography
Author
Perry, Joseph W.
Author_Institution
Dept. of Chem., Arizona Univ., Tucson, AZ, USA
fYear
1999
fDate
28-28 May 1999
Firstpage
312
Abstract
Summary form only given. Recent advances in the development of highly sensitive two-photon photoactive materials and their application in 3D-lithographic microfabrication will be presented.
Keywords
optical polymers; photolithography; two-photon processes; 3D-lithographic microfabrication; highly sensitive two-photon photoactive materials; two-photon 3D lithography; Biomedical optical imaging; Dosimetry; Fiber nonlinear optics; Lithography; Medical treatment; Nonlinear optics; Optical imaging; Optical interferometry; Optical scattering; Optical sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1999. CLEO '99. Summaries of Papers Presented at the Conference on
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-595-1
Type
conf
DOI
10.1109/CLEO.1999.834239
Filename
834239
Link To Document