• DocumentCode
    1870494
  • Title

    Analysis of current compliance on resistive switching of silver programmable metallization cells with stacked SiOx/SiO2 solid electrolytes

  • Author

    Jer-Chyi Wang ; Chun-Hsiang Chiu ; Ya-Ting Chan ; Chao-Sung Lai

  • Author_Institution
    Dept. of Electron. Eng., Chang Gung Univ., Taoyuan, Taiwan
  • fYear
    2015
  • fDate
    June 29 2015-July 2 2015
  • Firstpage
    548
  • Lastpage
    551
  • Abstract
    The influence of current compliance (ICC) on resistive switching (RS) of silver programmable metallization cells (Ag-PMCs) with stacked SiOx/SiO2 solid electrolytes has been investigated by carrier transportation and capacitance-voltage measurements. The low ICC of 10 μA leads to the superior multilevel RS characteristics because of a locally discontinuous conductive filament within the stacked solid electrolytes. Possible RS mechanisms of Ag-PMCs with different ICC are proposed according to the electrical analyses. Thus, the stacked-solid-electrolyte Ag-PMCs are considered as the promising candidate for future high-density nonvolatile memory application.
  • Keywords
    electrolytes; integrated circuit metallisation; programmable logic arrays; random-access storage; silicon compounds; silver; Ag; SiOx-SiO2; capacitance-voltage measurements; carrier transportation; current 10 muA; current compliance analysis; current compliance influence; nonvolatile memory; programmable metallization cells; resistive switching; solid electrolytes; Capacitance; Capacitance measurement; Capacitance-voltage characteristics; Resistance; Silver; Solids; Switches;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physical and Failure Analysis of Integrated Circuits (IPFA), 2015 IEEE 22nd International Symposium on the
  • Conference_Location
    Hsinchu
  • Type

    conf

  • DOI
    10.1109/IPFA.2015.7224455
  • Filename
    7224455