• DocumentCode
    1871054
  • Title

    The application of ion beam implantation for synthetic diamond surface modification

  • Author

    Wei Pu

  • Author_Institution
    Southwestern Inst. of Phys., Sichuan, China
  • fYear
    1997
  • fDate
    19-22 May 1997
  • Firstpage
    212
  • Lastpage
    213
  • Abstract
    Summary form only given. The ion beam implantation for surface modification of synthetic diamond tools and natural diamond have been widely investigated in previous work. In this article, the ion beam implantation for surface modification of synthetic diamond powder at the Southwestern Institute of physics is described. The nitrogen ion and titanium ion with energies of 20-70 keV have been chosen as the implantation ions, the experiment performed in the multifunction implanter which was developed by ourself. The ion depth distribution and microstructure have been tested by XRD (X-ray diffraction). It shows that the implanted ions have a good chemical combination with the surface saturationless bond carbon atom.
  • Keywords
    X-ray diffraction; diamond; ion beam effects; ion implantation; plasma applications; surface treatment; 20 to 70 keV; C; N ion; Ti ion; X-ray diffraction; ion beam implantation; ion depth distribution; microstructure; multifunction implanter; synthetic diamond surface modification; Chemicals; Ion beams; Microstructure; Nitrogen; Physics; Powders; Testing; Titanium; X-ray diffraction; X-ray scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3990-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.1997.604893
  • Filename
    604893