Research on application of ion implantation at SWIP

Author

Wei Pu

Author_Institution

Southwestern Inst. of Phys., Sichuan, China

fYear

1997

fDate

19-22 May 1997

Firstpage

213

Abstract

Summary form only given, as follows. In the last ten years, the research on application of ion implantation modification at SWIP in China has encompassed work in the areas of ion implantation equipment manufacture, material surface modification and its industrial applications including plasma source ion implantation (PSII) and ion beam ion implantation (IBII) technologies. Implantation equipment with the function of implantation and enhanced-deposition have been constructed. The MEVVA ion source for metal ion implantation and vacuum arc plasma source for metal plasma ion implantation and deposition have been employed successfully in IBII and PSII equipments respectively. Material surface modifications have been carried out in different modes. The modified workpieces have been tested in some industrial fields.

Keywords

ion implantation; plasma applications; surface treatment; vacuum arcs; MEVVA ion source; deposition; enhanced-deposition; ion beam ion implantation; ion implantation equipment manufacture; material surface modification; metal ion implantation; plasma source ion implantation; vacuum arc plasma source; Ion beams; Ion implantation; Ion sources; Manufacturing industries; Plasma applications; Plasma immersion ion implantation; Plasma materials processing; Plasma sources; Testing; Vacuum arcs;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on

Conference_Location

San Diego, CA, USA

ISSN

0730-9244

Print_ISBN

0-7803-3990-8

Type

conf

DOI

10.1109/PLASMA.1997.604894

Filename

604894