DocumentCode :
1871417
Title :
Microstructuring with femtosecond laser inside silica glasses
Author :
Naumov, A.Y. ; Przygodzki, C. ; Zhu, Xinen ; Corkum, P.B.
Author_Institution :
Nat. Res. Council of Canada, Ottawa, Ont., Canada
fYear :
1999
fDate :
28-28 May 1999
Firstpage :
356
Lastpage :
357
Abstract :
Summary form only given. Modification of the refractive index of transparent materials by UV laser radiation is widely used for writing waveguides and Bragg gratings in different type of glasses. Extending controlled writing to the inside of transparent materials is important since it opens a wide range of applications for integrated optical elements. In this work we report on direct writing of diffraction gratings and other optical elements inside different silica glasses with a train of femtosecond laser pulses at high repetition rate and study the influence of laser repetition rate and the number of pulses per focused area.
Keywords :
diffraction gratings; integrated optics; laser materials processing; optical fabrication; optical glass; silicon compounds; 50 fs; SiO/sub 2/ based glasses; UV laser radiation; diffraction gratings; direct writing; femtosecond laser pulse train; integrated optical elements; laser repetition rate; microstructuring; optical element writing; pulse number per focused area; refractive index modification; transparent materials; Glass; Optical materials; Optical pulses; Optical refraction; Optical variables control; Optical waveguides; Silicon compounds; Ultrafast optics; Waveguide lasers; Writing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 1999. CLEO '99. Summaries of Papers Presented at the Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-595-1
Type :
conf
DOI :
10.1109/CLEO.1999.834299
Filename :
834299
Link To Document :
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