Title :
Ultra-hard crystalline /spl beta/-C/sub 3/N/sub 4/ films synthesized using a reactive RF magnetron plasma source
Author :
Xu, Songcen ; Han-Shi Ki ; Lee, Sang-Rim ; Yin-An Li
Author_Institution :
Sch. of Sci., Nanyang Technol. Univ., Singapore
Abstract :
Summary form only given. Crystalline /spl beta/-C/sub 3/N/sub 4/ was successfully synthesized on KBr(100), KCl(100), Si(100) and stainless steel substrates using a purpose-designed, high density, low temperature, RF magnetron plasma source. The substrates were held at ambient temperature during deposition. The films were characterized using various analytical means. XRD, TEM and SEM analyses indicated that the films were of polycrystalline /spl beta/-C/sub 3/N/sub 4/ with the biggest crystal grain of over 20 /spl mu/m. XPS and EDX results showed that the films were composed primarily of carbon and nitrogen. The measured interplanar spacings were in good agreement with the theoretical predictions.
Keywords :
X-ray diffraction; X-ray photoelectron spectra; carbon compounds; electron spectra; plasma applications; plasma production; scanning electron microscopy; thin films; transmission electron microscopy; C/sub 3/N/sub 4/; EDX; FeC; KBr; KBr(100); KCl; KCl(100); SEM; Si; Si(100); TEM; X-ray diffraction; XPS; XRD; analytical method; interplanar spacings; reactive RF magnetron plasma source; scanning electron microscopy; stainless steel substrates; transmission electron microscopy; ultra-hard crystalline /spl beta/-C/sub 3/N/sub 4/ films; Crystallization; Current density; Ion implantation; Nitrogen; Plasma density; Plasma immersion ion implantation; Plasma materials processing; Plasma measurements; Plasma sources; Radio frequency;
Conference_Titel :
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location :
San Diego, CA, USA
Print_ISBN :
0-7803-3990-8
DOI :
10.1109/PLASMA.1997.604896
