Title :
Light induced frustration of etching in Fe doped LiNbO/sub 3/
Author :
Barry, I.E. ; Eason, R.W. ; Cook, G.
Author_Institution :
Optoelectron. Res. Centre, Southampton Univ., UK
Abstract :
Summary form only given. There is considerable interest in etching, structuring, and patterning a wide range of insulators, dielectrics, and semiconductors, for microelectronic and microphotonic device applications. The authors report a method of optical control of photoelectrochemical etching in lithium niobate doped with iron.
Keywords :
etching; iron; lithium compounds; photoelectrochemistry; surface chemistry; Fe doped LiNbO/sub 3/; LiNbO/sub 3/:Fe; etching; light induced frustration; lithium niobate; optical control; photoelectrochemical etching; Dielectric materials; Etching; Iron; Laser ablation; Optical materials; Optical pulse generation; Optical pulses; Optical surface waves; Surface emitting lasers; Surface fitting;
Conference_Titel :
Lasers and Electro-Optics, 1999. CLEO '99. Summaries of Papers Presented at the Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-595-1
DOI :
10.1109/CLEO.1999.834342
