Title :
Wet oxidation using single wafer furnace
Author :
Fukada, Takashi ; Yoo, Woo Sik ; Hiraga, Yasuhide ; Kang, Kitaek ; Komatsubara, Ryuichi
Author_Institution :
Tokyo Electron Yamanashi Ltd, Japan
Abstract :
To overcome the disadvantages of batch furnaces and single wafer rapid thermal processing (RTP) systems, a single wafer furnace (SWF) is designed. In this paper, wet oxidation is investigated using the SWRTF system. Oxide film thickness and uniformity were investigated as a function of temperature and process time.
Keywords :
furnaces; oxidation; rapid thermal processing; rapid thermal processing; single wafer furnace; wet oxidation; Electrodes; Energy efficiency; Furnaces; Hydrogen; Lamps; Molecular beam epitaxial growth; Oxidation; Rapid thermal processing; Silicon; Temperature measurement;
Conference_Titel :
Advanced Thermal Processing of Semiconductors 9th Internationa Conference on RTP 2001
Print_ISBN :
0-9638251-0-4
DOI :
10.1109/RTP.2001.1013753
