Title :
Backward Raman pulse compression of KrF laser using transient Raman scattering for the generation of high-power and high-energy UV laser pulse
Author :
Takahashi, E. ; Matsumoto, Y. ; Okuda, I. ; Kato, S. ; Owadano, Y. ; Kuwahara, K.
Author_Institution :
Electrotech. Lab., Tsukuba, Japan
Abstract :
Summary form only given. It is very difficult to create energetic high-intensity lasers in the UV region on account of the low damage thresholds of optical components and the low upconversion efficiencies for short pulses. We have been exploring an alternative approach to the high intensity UV pulse generation by combining a large KrF laser amplifier and a backward Raman pulse compression technique. The Raman conversion of KrF laser has many advantages suitable for large systems. For example, two photon absorption coefficient in fused silica window, which is important window material for large system, at the Stokes light wavelength (268 nm for methane gas) is more than three times smaller than the coefficient at KrF laser wavelength.
Keywords :
excimer lasers; krypton compounds; optical pulse compression; optical pulse generation; stimulated Raman scattering; 268 nm; KrF; Stokes pulses; UV pulse generation; backward Raman pulse compression; dephasing time difference; excimer laser; high-energy UV laser pulse; high-power pulse; large laser amplifier; transient Raman scattering; two photon absorption coefficient; Electromagnetic wave absorption; Gas lasers; Optical amplifiers; Optical devices; Optical pulse compression; Optical pulses; Pulse amplifiers; Pulse generation; Silicon compounds; Stimulated emission;
Conference_Titel :
Lasers and Electro-Optics, 1999. CLEO '99. Summaries of Papers Presented at the Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-595-1
DOI :
10.1109/CLEO.1999.834387