Title :
A tool to simulate optical lithography in nanoCMOs
Author :
Ferla, Tania Mara ; Flach, Guilherme ; Reis, R.
Author_Institution :
Inst. de Inf. - PGMicro/PPGC, Univ. Fed. do Rio Grande do Sul (UFRGS), Porto Alegre, Brazil
Abstract :
This paper presents the research and development of an optical simulation tool based on wavelets. The tool helps to decide the implementation of Resolution Enhancement Techniques (RET) such as Optical Proximity Correction (OPC) and double patterning. Optical lithography simulation is an essential step in a Design for Manufacturability (DFM) flow. Simulation is used in mask printability enhancement methods. Mask printability is improved by creating a modified mask for which the printed features resemble closely the features on the original mask. However lithography simulation is a compute-intensive task and a fast simulation is required to allow feasible mask correcting algorithms.
Keywords :
design for manufacture; photolithography; proximity effect (lithography); DFM flow; design for manufacturability; double patterning; mask printability; nanoCMO; optical lithography; optical proximity correction; resolution enhancement techniques; Adaptive optics; Image edge detection; Integrated circuit modeling; Lithography; Optical diffraction; Optical imaging; Wavelet transforms;
Conference_Titel :
Instrumentation and Measurement Technology Conference (I2MTC) Proceedings, 2014 IEEE International
Conference_Location :
Montevideo
DOI :
10.1109/I2MTC.2014.6860989
