Uniformity measurement of electron emission from carbon using electron beam resist

Author

Lee, J.H. ; Lee, S.H. ; Kim, W.S. ; Lee, H.J. ; Heo, J.N. ; Jeong, T.W. ; Choi, C.H. ; Kim, J.M.

Author_Institution

Nat. Creative Res. Initiatives Center for Electron Emission Source, Samsung Adv. Inst. of Technol., Suwon, South Korea

fYear

2004

fDate

11-16 July 2004

Firstpage

56

Lastpage

57

Abstract

In this report, the direct measurement of the emission sites from practically working CNT emitters is presented using an electron resist (ER) coated anode substrate. It allows checking a detailed emission site distribution from randomly oriented CNT emitters without light spreading effect when using a phosphor screen. The estimation of emission uniformity is best performed by general image comparison containing many dots of the developed ER surface images.

Keywords

carbon nanotubes; electron resists; field emitter arrays; nanotube devices; C; CNT emitters; ER surface images; electron beam resist; electron emission uniformity measurement; electron resist coated anode substrate; emission site distribution; emission sites direct measurement; general image comparison; light spreading effect; Anodes; Carbon nanotubes; Electron beams; Electron emission; Erbium; Flat panel displays; Pulse measurements; Research initiatives; Resists; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Nanoelectronics Conference, 2004. IVNC 2004. Technical Digest of the 17th International

Print_ISBN

0-7803-8397-4

Type

conf

DOI

10.1109/IVNC.2004.1354896

Filename

1354896