DocumentCode :
1873615
Title :
Uniformity measurement of electron emission from carbon using electron beam resist
Author :
Lee, J.H. ; Lee, S.H. ; Kim, W.S. ; Lee, H.J. ; Heo, J.N. ; Jeong, T.W. ; Choi, C.H. ; Kim, J.M.
Author_Institution :
Nat. Creative Res. Initiatives Center for Electron Emission Source, Samsung Adv. Inst. of Technol., Suwon, South Korea
fYear :
2004
fDate :
11-16 July 2004
Firstpage :
56
Lastpage :
57
Abstract :
In this report, the direct measurement of the emission sites from practically working CNT emitters is presented using an electron resist (ER) coated anode substrate. It allows checking a detailed emission site distribution from randomly oriented CNT emitters without light spreading effect when using a phosphor screen. The estimation of emission uniformity is best performed by general image comparison containing many dots of the developed ER surface images.
Keywords :
carbon nanotubes; electron resists; field emitter arrays; nanotube devices; C; CNT emitters; ER surface images; electron beam resist; electron emission uniformity measurement; electron resist coated anode substrate; emission site distribution; emission sites direct measurement; general image comparison; light spreading effect; Anodes; Carbon nanotubes; Electron beams; Electron emission; Erbium; Flat panel displays; Pulse measurements; Research initiatives; Resists; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2004. IVNC 2004. Technical Digest of the 17th International
Print_ISBN :
0-7803-8397-4
Type :
conf
DOI :
10.1109/IVNC.2004.1354896
Filename :
1354896
Link To Document :
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