Title :
Field emission of clean and oxidized Mo<110> microtips
Author :
Zhao, X. ; Outlaw, R.A. ; Champion, R.L. ; Wang, J.J. ; Manos, D.M. ; Holloway, B.C.
Author_Institution :
Dept. of Appl. Sci., Coll. of William & Mary, Williamsburg, VA, USA
Abstract :
In this paper, measurements of field emission taken on a molybdenum<110> microtip under ultrahigh vacuum conditions and as a function of oxygen exposure were reported. Auger electron spectroscopy (AES) was used to examine the clean and oxygen saturated surface of the Mo surface and the peak-to-peak ratio of O (KLL) to Mo (LMM) as a function of oxygen exposure.
Keywords :
Auger electron spectra; field emission; molybdenum; surface cleaning; AES; Auger electron spectroscopy; Mo; clean Mo<110> microtips; field emission; oxidized Mo<110> microtips; oxygen exposure; ultrahigh vacuum conditions; Bridges; Deconvolution; Electrons; Shape; Surface cleaning; Tunneling;
Conference_Titel :
Vacuum Nanoelectronics Conference, 2004. IVNC 2004. Technical Digest of the 17th International
Print_ISBN :
0-7803-8397-4
DOI :
10.1109/IVNC.2004.1354916
