DocumentCode
1874846
Title
A New Three-Dimensional Lithography Using Polymer Dispersed Liquid Crystal (PDLC) Films
Author
Jeon, Jin-Wan ; Choi, Joon-Yong ; Yoon, Jun-Bo ; Lim, Koeng Su
Author_Institution
Department of Electrical Engineering and Computer Science Korea Advanced Institute of Science and Technology (KAIST) 373-1 Guseong-dong, Yuseong-gu, Daejeon, Republic of Korea TEL:+82-42-869-8027, FAX:+82-42-869-8530, E-mail: didy@kaist.ac.kr
fYear
2006
fDate
2006
Firstpage
110
Lastpage
113
Abstract
In this paper, we have proposed a new three-dimensional (3-D) lithography using polymer dispersed liquid crystal (PDLC) films. The scattering or transmission rate of ultraviolet (UV) rays through the PDLC film can be continuously controlled by varying the applied voltage across its electrodes. Various slopes and profiles of 3-D photoresist microstructures are easily and effectively fabricated by controlling applied voltages and biasing times of the PDLC film during one UV exposure step of the lithography process.
Keywords
Lenses; Light scattering; Liquid crystal polymers; Lithography; Microoptics; Microstructure; Polymer films; Resists; Shape control; Voltage control;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2006. MEMS 2006 Istanbul. 19th IEEE International Conference on
Conference_Location
Istanbul, Turkey
ISSN
1084-6999
Print_ISBN
0-7803-9475-5
Type
conf
DOI
10.1109/MEMSYS.2006.1627748
Filename
1627748
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