• DocumentCode
    1874897
  • Title

    Field emission properties of ultra-high density vertical aligned silicon nanowires

  • Author

    She, J.C. ; Deng, S.Z. ; Jun Chen ; Xu, N.S.

  • Author_Institution
    State Key Lab of Optoelectron. Mater. & Technol., Sun Yat-sen (Zhongshan) Univ., Guangzhou, China
  • fYear
    2004
  • fDate
    11-16 July 2004
  • Firstpage
    152
  • Lastpage
    153
  • Abstract
    The results of the investigation on the field electron emission properties of silicon nanowires (SiNWs) are reported. The measurements were carried out in an ultra-high vacuum (∼10-9Torr) system. It was revealed that the SiNW arrays have a low threshold field of 0.3 MV/m for electron emission and a high emission current density, i.e., 3.5 A/cm2 at the applied field of ∼15 MV/m. It is proposed that the high aspect ratio and the high density of the wires should be the main advantages accounting for the excellent emission properties. These findings indicate that vertical aligned SiNW have a potential in cold cathode applications.
  • Keywords
    electron emission; elemental semiconductors; field emission; nanowires; silicon; Si; aspect ratio; emission current density; nanowire field electron emission properties; threshold field; ultra-high density vertical aligned nanowires; ultra-high vacuum system; wire density; Educational technology; Electron emission; Flat panel displays; Laboratories; Microstructure; Nanostructured materials; Nanowires; Scanning electron microscopy; Silicon; Sun;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference, 2004. IVNC 2004. Technical Digest of the 17th International
  • Print_ISBN
    0-7803-8397-4
  • Type

    conf

  • DOI
    10.1109/IVNC.2004.1354945
  • Filename
    1354945