DocumentCode
1874897
Title
Field emission properties of ultra-high density vertical aligned silicon nanowires
Author
She, J.C. ; Deng, S.Z. ; Jun Chen ; Xu, N.S.
Author_Institution
State Key Lab of Optoelectron. Mater. & Technol., Sun Yat-sen (Zhongshan) Univ., Guangzhou, China
fYear
2004
fDate
11-16 July 2004
Firstpage
152
Lastpage
153
Abstract
The results of the investigation on the field electron emission properties of silicon nanowires (SiNWs) are reported. The measurements were carried out in an ultra-high vacuum (∼10-9Torr) system. It was revealed that the SiNW arrays have a low threshold field of 0.3 MV/m for electron emission and a high emission current density, i.e., 3.5 A/cm2 at the applied field of ∼15 MV/m. It is proposed that the high aspect ratio and the high density of the wires should be the main advantages accounting for the excellent emission properties. These findings indicate that vertical aligned SiNW have a potential in cold cathode applications.
Keywords
electron emission; elemental semiconductors; field emission; nanowires; silicon; Si; aspect ratio; emission current density; nanowire field electron emission properties; threshold field; ultra-high density vertical aligned nanowires; ultra-high vacuum system; wire density; Educational technology; Electron emission; Flat panel displays; Laboratories; Microstructure; Nanostructured materials; Nanowires; Scanning electron microscopy; Silicon; Sun;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference, 2004. IVNC 2004. Technical Digest of the 17th International
Print_ISBN
0-7803-8397-4
Type
conf
DOI
10.1109/IVNC.2004.1354945
Filename
1354945
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