DocumentCode :
1874921
Title :
Fabrication of the Flexible Sensor Using SOI Wafer by Removing the Thick Silicon Layer
Author :
Noda, Kentaro ; Hoshino, Kazunori ; Matsumoto, Kiyoshi ; Shimoyama, Isao
Author_Institution :
Department of Mechano-Informatics, Graduate School of Information Science and Technology, The University of Tokyo 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan, E-mail: noda@leopard.t.u-tokyo.ac.jp
fYear :
2006
fDate :
2006
Firstpage :
122
Lastpage :
125
Abstract :
In this paper, we propose a method to fabricate a flexible sensor, which uses thin single crystal silicon devices for sensing. In this method, we formed sensing devices on the top of an SOI wafer and removed a thick silicon layer from it to make the sensor flexible. To protect the thin silicon structure during the process, we covered it with an elastic material. By using this method and the sensing mechanism we proposed in MEMS’ 05 [ 1], we fabricated a 2.0mm thick flexible tactile sensor with 290 nm thick piezoresistive cantilevers. We measured shear stresses by using this flexible sensor and confirmed its effectiveness.
Keywords :
Chromium; Conducting materials; Fabrication; Force measurement; Piezoresistance; Protection; Robot sensing systems; Silicon devices; Stress; Tactile sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2006. MEMS 2006 Istanbul. 19th IEEE International Conference on
Conference_Location :
Istanbul, Turkey
ISSN :
1084-6999
Print_ISBN :
0-7803-9475-5
Type :
conf
DOI :
10.1109/MEMSYS.2006.1627751
Filename :
1627751
Link To Document :
بازگشت