Title :
AlN coatings on silicon field emitters and oxidised gates to enhance reliability for space applications
Author :
Wang, L. ; Aplin, K.L. ; Kent, B.J. ; Huq, S.E. ; Stevens, R. ; Thomas, G.R. ; Loader, I.M. ; Collingwood, C.M. ; Malik, A. ; Blom, H.O.
Author_Institution :
Central Miscrostructure Facility, Rutherford Appleton Lab., Didcot, UK
Abstract :
This paper describes the development of coatings for silicon field emission arrays used as an electron source to maintain spacecraft charge neutrality. The neutraliser specification includes 6 mA emission current at 0.2 W/mA and the instrument is required to operate for a lifetime of >6000 hours. To make the field emission device more resistant to ion bombardment and thermal failure, the effects of adding a layer of aluminium nitride (AlN), and thermal oxidation of the chromium gate electrode have been investigated. Different thicknesses of AlN film have been sputter coated onto the emitters under a variety of chamber pressure conditions. The thermally oxidised samples have been analysed by ESCA (Electron Spectroscopy for Chemical Analysis) and ERDA (Elastic Recoil Detection Analysis). For the oxidised chromium the composition is Cr = 0.31 and O = 0.69.
Keywords :
Rutherford backscattering; aluminium compounds; chromium; electron spectra; field emitter arrays; ion microprobe analysis; ion-surface impact; oxidation; reliability; sputtered coatings; 6 mA; AlN-Cr; AlN-Si; ERDA; ESCA; coatings; elastic recoil detection analysis; electron source; electron spectroscopy for chemical analysis; enhance reliability; field emission arrays; gate electrode; neutraliser specification; oxidised gates; resistant to ion bombardment; space applications; spacecraft charge neutrality; sputter coating; thermal failure; thermal oxidation; Aluminum; Chemical analysis; Chromium; Coatings; Electron sources; Instruments; Maintenance; Silicon; Space vehicles; Thermal resistance;
Conference_Titel :
Vacuum Nanoelectronics Conference, 2004. IVNC 2004. Technical Digest of the 17th International
Print_ISBN :
0-7803-8397-4
DOI :
10.1109/IVNC.2004.1354949