DocumentCode
1876295
Title
Effect of erbium ion concentration on gain spectral hole burning in silica-based erbium-doped fiber
Author
Ono, S. ; Tanabe, S. ; Nishihara, M. ; Ishikawa, E.
Author_Institution
Graduate Sch. of Human & Environ. Studies, Kyoto Univ., Japan
Volume
4
fYear
2005
fDate
6-11 March 2005
Abstract
The erbium concentration dependence of gain spectral hole burning in EDF was investigated. We propose the energy transfer mechanism between Er ions, which contributes to the suppression of the second-hole at 1530 nm.
Keywords
doping profiles; erbium; optical fibre amplifiers; optical fibre testing; optical hole burning; 1530 nm; EDF; Er ion energy transfer mechanism; erbium ion concentration; gain spectral hole burning; second-hole suppression; silica-based erbium-doped fiber; Doped fiber amplifiers; Erbium; Erbium-doped fiber amplifier; Optical attenuators; Optical fiber polarization; Optical saturation; Particle beam optics; Probes; Stimulated emission; Wavelength measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Fiber Communication Conference, 2005. Technical Digest. OFC/NFOEC
Print_ISBN
1-55752-783-0
Type
conf
DOI
10.1109/OFC.2005.192962
Filename
1501500
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