DocumentCode :
1876449
Title :
Effect of thermal annealing on emission characteristics of nano electron source fabricated using beam assisted process
Author :
Murakami, K. ; Yamasaki, N. ; Abo, S. ; Wakaya, F. ; Takai, M.
Author_Institution :
Res. Center For Mater. Sci. at Extreme Conditions, Osaka Univ., Japan
fYear :
2004
fDate :
11-16 July 2004
Firstpage :
256
Lastpage :
257
Abstract :
In this study, the thermal annealing effects on a single field emitter from the view point of the leakage current between the gate and cathode were investigated. The emission efficiency and percentage of working nano electron sources fabricated beam assisted processes were improved by thermal annealing. Thus the post annealing after beam-assisted processes is effective in reducing leakage current in nano electron sources.
Keywords :
annealing; cathodes; electron field emission; electron sources; leakage currents; beam assisted process; cathode; emission characteristics; emission efficiency; gate; leakage current; nano electron source; single field emitter; thermal annealing; Annealing; Atmosphere; Cathodes; Electrodes; Electron beams; Electron sources; Fabrication; Gold; Leakage current; Sputtering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2004. IVNC 2004. Technical Digest of the 17th International
Print_ISBN :
0-7803-8397-4
Type :
conf
DOI :
10.1109/IVNC.2004.1355002
Filename :
1355002
Link To Document :
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