DocumentCode :
1876560
Title :
Optimization of stress-induced pockels effect in silicon waveguides for optical modulators
Author :
Aleali, Alireza ; Danxia Xu ; Schmid, Jens H. ; Cheben, Pavel ; Ye, Winnie N.
Author_Institution :
Nat. Res. Council of Canada, Ottawa, ON, Canada
fYear :
2013
fDate :
28-30 Aug. 2013
Firstpage :
109
Lastpage :
110
Abstract :
A method for the optimization of strain-induced Pockels effect in silicon waveguides is proposed. We introduce a new figure of merit and show a 35% enhancement in FOM compared to most efficient reported devices.
Keywords :
Pockels effect; elemental semiconductors; optical modulation; optical waveguides; silicon; Si; optical modulators; optimization; silicon waveguides; stress-induced Pockels effect; Electrooptic effects; Electrooptic modulators; Electrooptical waveguides; Silicon; Strain; Electro-Optic Effect; Modulator; Pockels Effect; Silicon; Strain;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics (GFP), 2013 IEEE 10th International Conference on
Conference_Location :
Seoul
ISSN :
1949-2081
Print_ISBN :
978-1-4673-5803-3
Type :
conf
DOI :
10.1109/Group4.2013.6644453
Filename :
6644453
Link To Document :
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