DocumentCode :
1876573
Title :
Multilayer planar nanostructured SSE cathodes
Author :
Semet, V. ; Binh, V.T. ; Zhang, J.P. ; Yang, J. ; Khan, M.Asif ; Tsu, R.
Author_Institution :
Equipe Emission Electron., Univ. Claude Bernard, Villeurbanne, France
fYear :
2004
fDate :
11-16 July 2004
Firstpage :
264
Lastpage :
265
Abstract :
Multilayer planar nanostructured solid-state field-controlled emission (SSE) are studied. SSE is an approach to control the effective surface barrier for electron emission by monitoring the space charge value of an ultra-thin layer at the surface, or in other terms to lower the effective surface barrier by modifying the electronic properties of the underneath surface layer. A 0.15 μm-thick Si-doped AlGaN layer with Al-content graded from 40% to 15% was deposited on a SiC substrate. It served as the conducting buffer layer. The finished surface was characterized to be atomically smooth by atomic force microscope. The I-V measurements were performed with a scanning anode field emission microscope (SAFEM). Two mechanisms were found to be present, first is tunneling field emission through a lowering work function. The electrons are emitted by a field emission mechanism from the quantized sub-bands inside the GaN quantum well, given a current density JFN. The second mechanism occurs for elevated temperatures, i.e. kBT > 0.8 eV, when hot electrons can jump over the first barrier located between the conductive substrate and the Al0.5Ga0.5N ultra-thin layer. As the second barrier at the surface is lower (less than 0.5 eV due to space charge) these electrons will emit directly. This first barrier controls the variation of the emitted current JTH with temperature. In this dual-barrier model, the measured total emission current, Jmes, will be the sum of both contributions, Jmes = JFN + JTH.
Keywords :
III-V semiconductors; aluminium compounds; atomic force microscopy; cathodes; current density; electron field emission; elemental semiconductors; gallium compounds; nanostructured materials; scanning electron microscopes; semiconductor quantum wells; silicon; space charge; work function; 0.15 mum; AlGaN:S; atomic force microscope; conducting buffer layer; current density; electron emission; electronic properties; emitted current; multilayer planar nanostructured solid-state field-controlled emission cathodes; quantized sub-bands; quantum well; scanning anode field emission microscope; space charge; surface barrier; tunneling field emission; ultra-thin layer; work function; Aluminum gallium nitride; Atomic force microscopy; Atomic layer deposition; Atomic measurements; Cathodes; Electron emission; Monitoring; Nonhomogeneous media; Solid state circuits; Space charge;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2004. IVNC 2004. Technical Digest of the 17th International
Print_ISBN :
0-7803-8397-4
Type :
conf
DOI :
10.1109/IVNC.2004.1355007
Filename :
1355007
Link To Document :
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