• DocumentCode
    1877109
  • Title

    Effect of mask grid on SOI arrayed waveguide grating performance

  • Author

    Pathak, Sant ; Vanslembrouck, Michael ; Dumon, P. ; Van Thourhout, Dries ; Bogaerts, W.

  • Author_Institution
    Photonics Res. Group (INTEC), Ghent Univ. - imec, Ghent, Belgium
  • fYear
    2013
  • fDate
    28-30 Aug. 2013
  • Firstpage
    31
  • Lastpage
    32
  • Abstract
    We studied the impact of the lithography mask grid on the performance of silicon AWGs, and show a dramatic improvement in crosstalk of 5dB when going from a 5nm to a 1nm grid.
  • Keywords
    elemental semiconductors; integrated optics; integrated optoelectronics; lithography; optical crosstalk; optical fabrication; optical waveguides; silicon-on-insulator; AWG; SOI arrayed waveguide grating performance; Si; crosstalk; lithography mask grid; silicon-on-insulator; Adaptive optics; Arrayed waveguide gratings; Crosstalk; Delay lines; Multiplexing; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics (GFP), 2013 IEEE 10th International Conference on
  • Conference_Location
    Seoul
  • ISSN
    1949-2081
  • Print_ISBN
    978-1-4673-5803-3
  • Type

    conf

  • DOI
    10.1109/Group4.2013.6644475
  • Filename
    6644475
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1877109