Self Assembled Monolayer Patterning Using Capillary Force Lithography

A high performance, high throughput, low cost, and simple technique for patterning self-assembled monolayer (SAM) is successfully demonstrated in this report. Capillary force lithography is employed to generate micro features of protein resistant poly (ethylene glycol) (PEG) self-assembled monolayer on Si/SiO2substrate for accurate protein patterning. The monolayer shows significant reduction, > 99%, of nonspecific protein adsorption compared to bare Si/SiO2substrate. Large area, in the order of centimeter, of high-density array (500 × 500) of 2 µ m features can be resolved with high fidelity. This method alleviates the difficulties and complexities in SAM patterning using micro contact printing and photolithography. To our knowledge, this is the first demonstration of capillary force lithography for patterning self-assembled monolayers.