DocumentCode
1879231
Title
A Micromachined Titanium Sputter Ion Pump for Cavity Pressure Control
Author
Wright, Scott A. ; Gianchandani, Yogesh B.
Author_Institution
Solid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave., Ann Arbor, MI 48109, USA; Tel:
fYear
2006
fDate
2006
Firstpage
754
Lastpage
757
Abstract
This paper describes a micro-scale sputter ion pump and its use in the controlled reduction of pressure in a large cavity package. The pump is composed of titanium electrodes on a glass substrate which are sputtered away and form the source of Ti ions that react and bind with oxygen and nitrogen. The discharges are powered by DC and pulsed DC high voltage. The duration of applied voltage determines the amount of sputtered titanium and consequently, the pressure reduction inside a cavity. To date, the pressure inside sealed commercial packages of volumes 6.33 cm3and 2.2 cm3, has been reduced by 168 Torr and 126 Torr, respectively.
Keywords
Atmospheric-pressure plasmas; Electrodes; Gettering; Glass; Magnetic confinement; Packaging; Plasma applications; Plasma confinement; Pressure control; Titanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2006. MEMS 2006 Istanbul. 19th IEEE International Conference on
Conference_Location
Istanbul, Turkey
ISSN
1084-6999
Print_ISBN
0-7803-9475-5
Type
conf
DOI
10.1109/MEMSYS.2006.1627909
Filename
1627909
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