• DocumentCode
    1880405
  • Title

    Ultra small InAs/GaInP/InP quantum dots [MOMBE growth]

  • Author

    Raz, T. ; Ritter, D. ; Bahir, G. ; Gershoni, D.

  • Author_Institution
    Dept. of Electr. Eng., Technion-Israel Inst. of Technol., Haifa, Israel
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    63
  • Lastpage
    66
  • Abstract
    InAs quantum dots were grown on tensile strained GaxIn1-xP layers having a Ga content between x=0 to x=0.3, on InP substrates. The vertical dimension of these quantum dots is demonstrated to be just 2 to 8 monolayers. The PL emission is composed of distinct peaks, each peak attributed to quantum dots having the same height. The size distribution of the quantum dots depends on their growth time, as well as on the Ga content in the strained GaxIn1-xP layer underneath. A comparison between an 8 band k·P model and the measured energy levels, reveals that Ga atoms diffused from the GaxIn1-xP layer into the quantum dots. The Ga concentration in the quantum dots reached 19%, for dots grown on Ga0.3In0.7P.
  • Keywords
    chemical beam epitaxial growth; gallium compounds; indium compounds; photoluminescence; semiconductor epitaxial layers; semiconductor growth; semiconductor quantum dots; InAs-GaInP-InP; InAs/GaInP/InP; MOMBE; PL emission; energy levels; growth time; k·P model; quantum dots; size distribution; vertical dimension; Atomic force microscopy; Atomic layer deposition; Atomic measurements; Capacitive sensors; Cities and towns; Force measurement; Indium phosphide; Lattices; Quantum dots; US Department of Transportation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials Conference, 2002. IPRM. 14th
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-7320-0
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2002.1014105
  • Filename
    1014105