Title :
Planar waveguide devices on silicon
Author :
Miyashita, Tadashi
Author_Institution :
Photonic Integration Res. Inc., Columbus, OH, USA
Abstract :
A wide variety of planar optical waveguide devices were developed based on silica-glass-on-silicon technology. High-performance waveguides with low loss and precisely controlled geometry are formed on silicon substrates by a combination of flame hydrolysis deposition and photolithographic and reactive ion etching processes. This optical-fiber-compatible planar waveguide technology is flexible enough to provide a wide variety of high-performance and cost-effective optical devices such as branching, wavelength division multidemultiplexer, frequency control, switching and interconnection devices
Keywords :
integrated optics; optical glass; optical losses; optical waveguides; optical workshop techniques; photolithography; silicon compounds; spray coating techniques; sputter etching; Si substrates; SiO2-Si; branching; controlled geometry; cost-effective optical devices; flame hydrolysis deposition; frequency control; high-performance; integrated optical devices; interconnection devices; low loss; optical-fiber-compatible planar waveguide technology; photolithographic processes; planar optical waveguide devices; reactive ion etching processes; silica glass; switching; wavelength division multidemultiplexer; Fires; Geometrical optics; Optical devices; Optical losses; Optical planar waveguides; Optical variables control; Optical waveguides; Particle beam optics; Planar waveguides; Silicon;
Conference_Titel :
Electronic Components and Technology Conference, 1990. ., 40th
Conference_Location :
Las Vegas, NV
DOI :
10.1109/ECTC.1990.122167
