Title :
Metrology standards for advanced semiconductor lithography referenced to atomic spacings and geometry
Author :
Teague, E.C. ; Linholm, L.W. ; Cresswell, M.W. ; Penzes, W.B. ; Kramar, I.A. ; Scire, F.E. ; Villarrubia, J.S. ; Jun, I.S.
Author_Institution :
Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
Abstract :
It is shown how the needs for calibrating the positional accuracy of features of an X-ray mask membrane or an optical reticle can be addressed by application of a high-accuracy coordinate metrology system known as the Molecular Measuring Machine (M-Cubed). Based on scanning tunneling microscopy and state-of-the-art heterodyne optical interferometry, the measurements of M-Cubed are referenced to fundamental standards of length and angle and with the atomic-resolution of its scanning tunneling microscope probe are validated against the interatomic spacings and geometry of single crystal surfaces. Through the use of a stable reference grid, serving as an intermediate calibration artifact, the positional accuracy of features on an X-ray mask membrane or an optical reticle can be referenced to fundamental standards of length and angle by means of the metrology system of M-Cubed
Keywords :
calibration; light interferometry; lithography; masks; measurement standards; scanning tunnelling microscopy; M-Cubed; Molecular Measuring Machine; X-ray mask membrane; atomic spacings; coordinate metrology; heterodyne optical interferometry; interatomic spacings; intermediate calibration artifact; optical reticle; positional accuracy; reference grid; scanning tunneling microscopy; semiconductor lithography; Atom optics; Atomic measurements; Biomembranes; Coordinate measuring machines; Lithography; Metrology; Optical interferometry; Optical microscopy; Optical mixing; Tunneling;
Conference_Titel :
Microelectronic Test Structures, 1993. ICMTS 1993. Proceedings of the 1993 International Conference on
Conference_Location :
Sitges
Print_ISBN :
0-7803-0857-3
DOI :
10.1109/ICMTS.1993.292918