• DocumentCode
    1882698
  • Title

    Oxides on SiC

  • Author

    Cooper, James A., Jr.

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
  • fYear
    1997
  • fDate
    4-6 Aug 1997
  • Firstpage
    236
  • Lastpage
    243
  • Abstract
    Silicon carbide (SiC) is the only compound semiconductor whose native oxide is SiO2. This makes it possible to construct a variety of MOS devices in SiC. However, the SiC MOS interface is more complex than on silicon, due to the presence of carbon in the compound and the non-cubic crystal structure. Over the last few years, the midgap interface state density on p-type 6H-SiC has been reduced from the mid-1011 to the mid-1010 eV-1 cm -2 range, and the fixed oxide charge from about 2×10 12 to 5×1011 cm-2. Studies of oxide reliability are underway, and preliminary results on n-type 6H-SiC extrapolate to a lifetime of 20,000 years at a field of 3 MV/cm at 145°C
  • Keywords
    MIS devices; interface states; oxidation; silicon compounds; wide band gap semiconductors; 145 C; 20000 year; MOS device; SiC-SiO2; compound semiconductor; fixed oxide charge; lifetime; midgap interface state density; n-type 6H-SiC; native oxide; noncubic crystal structure; p-type 6H-SiC; reliability; silicon carbide; Silicon compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High Speed Semiconductor Devices and Circuits, 1997. Proceedings., 1997 IEEE/Cornell Conference on Advanced Concepts in
  • Conference_Location
    Ithaca, NY
  • ISSN
    1079-4700
  • Print_ISBN
    0-7803-3970-3
  • Type

    conf

  • DOI
    10.1109/CORNEL.1997.649363
  • Filename
    649363