Title :
High vertical aspect ratio LIGA microwave 3-dB coupler
Author :
Kachayev, Anton A. ; Klymyshyn, David M. ; Achenbach, Sven ; Saile, Volker
Author_Institution :
TR Labs, Saskatchewan Univ., Saskatoon, Sask., Canada
Abstract :
This paper focuses on microwave directional couplers fabricated using synchrotron deep X-ray lithography (DXRL), an advanced micro- and nanofabrication technology allowing the design of microwave structures with improved performance by exploring the third dimension - metal height. Demonstrated are the influence of increased metal height on the structure characteristics and performance unattainable through conventional planar fabrication techniques.
Keywords :
LIGA; directional couplers; nanotechnology; 3 dB; LIGA microwave directional coupler; microfabrication; microwave structure design; nanofabrication; planar fabrication; synchrotron deep X-ray lithography; Conductors; Coplanar waveguides; Directional couplers; Electromagnetic waveguides; Fabrication; Microstructure; Microwave technology; Radio frequency; Synchrotrons; X-ray lithography;
Conference_Titel :
MEMS, NANO and Smart Systems, 2003. Proceedings. International Conference on
Print_ISBN :
0-7695-1947-4
DOI :
10.1109/ICMENS.2003.1221961
