Title :
Monte Carlo study of electron transport in AlSb/InAs HEMT structures
Author :
Thobel, J.L. ; Bonno, O. ; Boutry, H. ; Dessenne, E.
Author_Institution :
Inst. d´´Electronique et de Microelectronique du Nord, Univ. des Sci. et Technol. de Lille Flandres Artois, Villeneuve d´´Ascq, France
Abstract :
A Monte Carlo model of in-plane electron transport in InAs/AlSb heterostructures is presented. Special attention has been paid to the effects of nonparabolicity, which are crucial for such a narrow gap system. Electron states are obtained from a Ben Daniel-Duke equation with energy-dependent effective mass. The effect of band mixing on scattering rates is included, at an approximate level, through the use of a "Bloch overlap factor". It has been shown that neglecting this factor leads to a strong underestimation of electron mobility, whereas our model gives realistic values. We have studied a standard single well structure and a more sophisticated double well structure. In the latter case, the electron transfer between the two coupled wells has been discussed.
Keywords :
III-V semiconductors; Monte Carlo methods; aluminium compounds; effective mass; electron mobility; high electron mobility transistors; indium compounds; interface states; semiconductor device models; semiconductor quantum wells; AlSb-InAs; AlSb/InAs HEMT structures; Ben Daniel-Duke equation; Bloch overlap factor; InAs/AlSb heterostructures; Monte Carlo model; band mixing; double well structure; electron mobility; electron states; electron transfer; energy-dependent effective mass; in-plane electron transport; narrow gap system; nonparabolicity; quantum wells; scattering rates; single well structure; Conducting materials; Effective mass; Eigenvalues and eigenfunctions; Electron mobility; HEMTs; MODFETs; Monte Carlo methods; Poisson equations; Scattering; Wave functions;
Conference_Titel :
Indium Phosphide and Related Materials Conference, 2002. IPRM. 14th
Print_ISBN :
0-7803-7320-0
DOI :
10.1109/ICIPRM.2002.1014301