DocumentCode :
1886004
Title :
Paramagnetic defect creation and charge trapping in SIMOX films at high and very high dose levels
Author :
Devine, R.A.B. ; Leray, J.L. ; Margail, J.
Author_Institution :
CNET, Meylan, France
fYear :
1991
fDate :
1-3 Oct 1991
Firstpage :
10
Lastpage :
11
Abstract :
Electron spin-resonance of the oxygen vacancy center (ESR) E´ has proved to be an interesting tool for investigating SIMOX (separation by implanted oxygen) buried oxide (BOX) irradiation behavior. The authors present experimental data concerning the relationship between trapped charge and E´ signal after irradiation. The SIMOX BOX was prepared in a standard single implant process at the CEA. Irradiations were made using an Aracor 4100 10-keV X-ray irradiator (400 krad(SiO2)/min). It is found that E´ center generation and charge trapping are both connected via the electron-hole generation nonrecombination yield. This is consistent with the classical picture of an E´ center as directly associated with a trapped hole
Keywords :
X-ray effects; defect electron energy states; hole traps; ion implantation; paramagnetic resonance of defects; semiconductor-insulator boundaries; 10 keV; E´ center generation; ESR; SIMOX BOX; SIMOX films; X-ray irradiator; buried oxide; charge trapping; electron-hole generation nonrecombination yield; irradiation behavior; paramagnetic defects; single implant process; trapped hole; very high dose levels; Electrodes; Electron traps; Implants; MOS capacitors; MOSFETs; Monitoring; Paramagnetic materials; Paramagnetic resonance; Silicon; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 1991. Proceedings, 1991., IEEE International
Conference_Location :
Vail Valley, CO
Print_ISBN :
0-7803-0184-6
Type :
conf
DOI :
10.1109/SOI.1991.162831
Filename :
162831
Link To Document :
بازگشت