• DocumentCode
    1886004
  • Title

    Paramagnetic defect creation and charge trapping in SIMOX films at high and very high dose levels

  • Author

    Devine, R.A.B. ; Leray, J.L. ; Margail, J.

  • Author_Institution
    CNET, Meylan, France
  • fYear
    1991
  • fDate
    1-3 Oct 1991
  • Firstpage
    10
  • Lastpage
    11
  • Abstract
    Electron spin-resonance of the oxygen vacancy center (ESR) E´ has proved to be an interesting tool for investigating SIMOX (separation by implanted oxygen) buried oxide (BOX) irradiation behavior. The authors present experimental data concerning the relationship between trapped charge and E´ signal after irradiation. The SIMOX BOX was prepared in a standard single implant process at the CEA. Irradiations were made using an Aracor 4100 10-keV X-ray irradiator (400 krad(SiO2)/min). It is found that E´ center generation and charge trapping are both connected via the electron-hole generation nonrecombination yield. This is consistent with the classical picture of an E´ center as directly associated with a trapped hole
  • Keywords
    X-ray effects; defect electron energy states; hole traps; ion implantation; paramagnetic resonance of defects; semiconductor-insulator boundaries; 10 keV; E´ center generation; ESR; SIMOX BOX; SIMOX films; X-ray irradiator; buried oxide; charge trapping; electron-hole generation nonrecombination yield; irradiation behavior; paramagnetic defects; single implant process; trapped hole; very high dose levels; Electrodes; Electron traps; Implants; MOS capacitors; MOSFETs; Monitoring; Paramagnetic materials; Paramagnetic resonance; Silicon; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 1991. Proceedings, 1991., IEEE International
  • Conference_Location
    Vail Valley, CO
  • Print_ISBN
    0-7803-0184-6
  • Type

    conf

  • DOI
    10.1109/SOI.1991.162831
  • Filename
    162831