DocumentCode :
1887959
Title :
Fabrication of highly stable carbon nanotube electron beams(C-beam)
Author :
Jung Su Kang ; Su Woong Lee ; Ha Rim Lee ; Ji Hwan Hong ; Callixte, Shikili ; Min Tae Chung ; Kyu Chang Park
Author_Institution :
Dept. of Inf. Display, Kyung Hee Univ., Seoul, South Korea
fYear :
2015
fDate :
13-17 July 2015
Firstpage :
92
Lastpage :
93
Abstract :
We optimized the triode structure for carbon nanotube electron beam(C-beam) application with carbon nanotube emitters grown with resist-assisted pattering process. The CNT emitters grown through the RAP process have a structure in which a number of CNTs are congregated, and the graphitization post-treatment process proceeded in order to enhance their adhesive strength and stability. The gate mesh was self-aligned with the carbon nanotube island for lower leakage current, resulting higher electron emission current and transmission ratio. With the optimized triode structure, the emission current show high performance with less than 1 cm2 area and C-beams operated more than 500 hours with constant current mode and DC driving.
Keywords :
carbon nanotubes; electron beams; electron emission; graphitisation; leakage currents; triodes; C; C-beam; CNT emitters; DC driving; RAP process; adhesive strength; carbon nanotube electron beams; carbon nanotube emitters; carbon nanotube island; electron emission current; graphitization post-treatment process; leakage current; resist-assisted pattering process; triode structure; Anodes; Carbon nanotubes; Current measurement; Electron emission; Logic gates; Performance evaluation; Voltage measurement; CNT; Field emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2015 28th International
Conference_Location :
Guangzhou
Print_ISBN :
978-1-4673-9356-0
Type :
conf
DOI :
10.1109/IVNC.2015.7225542
Filename :
7225542
Link To Document :
بازگشت