Effect of plasma processing reactor circuitry on plasma characteristics

Summary form only given. It is well know that external circuitry greatly influences the performance of plasma processing reactors. Simulation of external circuits difficult since the time in which the external circuit attains the steady-state is several orders of magnitude longer than typical plasma simulation time scales. In this paper, we present a technique to simulate the external circuit concurrently with the plasma and implement it into the Hybrid Plasma Equipment Model (HPEM). The resulting model is used to investigate the influence of external circuitry on plasma behavior.