DocumentCode
1888767
Title
Open NSO Modeling for DFM
Author
Wang, Junping ; Ning, Pan ; Le Wang ; Su, Yongbang ; Liu, Shigang ; Wan, Guoting ; Wang, Song
Author_Institution
Sch. of Commun. Eng., Xidian Univ., Xi´´an, China
fYear
2010
fDate
25-26 Dec. 2010
Firstpage
1
Lastpage
3
Abstract
With the development of 90-nm and 65-nm technology, a layout optimization relating to real defects has become a necessity for DFM (Design for Manufacturability). In order to optimize a layout, it is essential to extract the position of nets from the layout. The paper provides a novel NSO (Net Sensitivity for Opens) model of arbitrary defect and layout, which takes into account the critical area and the nets area as well as the size distribution of random defects. An algorithm of this model is also presented based on mathematical morphology. Some results of experiments show that the proposed model can give the position of nets in the layout and provide reliable foundation for reduction of the loss of yield.
Keywords
design for manufacture; nanotechnology; optimisation; DFM; arbitrary defect; arbitrary layout; design for manufacturability; layout optimization; nanotechnology development; net-sensitivity-for-opens model; open NSO modeling; random defects distribution; Algorithm design and analysis; Layout; Manufacturing; Mathematical model; Optimization; Routing; Sensitivity;
fLanguage
English
Publisher
ieee
Conference_Titel
Information Engineering and Computer Science (ICIECS), 2010 2nd International Conference on
Conference_Location
Wuhan
ISSN
2156-7379
Print_ISBN
978-1-4244-7939-9
Electronic_ISBN
2156-7379
Type
conf
DOI
10.1109/ICIECS.2010.5677810
Filename
5677810
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