• DocumentCode
    1888767
  • Title

    Open NSO Modeling for DFM

  • Author

    Wang, Junping ; Ning, Pan ; Le Wang ; Su, Yongbang ; Liu, Shigang ; Wan, Guoting ; Wang, Song

  • Author_Institution
    Sch. of Commun. Eng., Xidian Univ., Xi´´an, China
  • fYear
    2010
  • fDate
    25-26 Dec. 2010
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    With the development of 90-nm and 65-nm technology, a layout optimization relating to real defects has become a necessity for DFM (Design for Manufacturability). In order to optimize a layout, it is essential to extract the position of nets from the layout. The paper provides a novel NSO (Net Sensitivity for Opens) model of arbitrary defect and layout, which takes into account the critical area and the nets area as well as the size distribution of random defects. An algorithm of this model is also presented based on mathematical morphology. Some results of experiments show that the proposed model can give the position of nets in the layout and provide reliable foundation for reduction of the loss of yield.
  • Keywords
    design for manufacture; nanotechnology; optimisation; DFM; arbitrary defect; arbitrary layout; design for manufacturability; layout optimization; nanotechnology development; net-sensitivity-for-opens model; open NSO modeling; random defects distribution; Algorithm design and analysis; Layout; Manufacturing; Mathematical model; Optimization; Routing; Sensitivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Information Engineering and Computer Science (ICIECS), 2010 2nd International Conference on
  • Conference_Location
    Wuhan
  • ISSN
    2156-7379
  • Print_ISBN
    978-1-4244-7939-9
  • Electronic_ISBN
    2156-7379
  • Type

    conf

  • DOI
    10.1109/ICIECS.2010.5677810
  • Filename
    5677810