DocumentCode
1888817
Title
Flicker noise in thin film fully depleted SOI MOSFETs
Author
Hsu, Jen-Tai ; Wang, Janet ; Woo, Jason ; Viswanathan, C.R.
Author_Institution
California Univ., Los Angeles, CA, USA
fYear
1991
fDate
1-3 Oct 1991
Firstpage
30
Lastpage
31
Abstract
The low-frequency noise behavior in both the linear and saturation regimes of operation for fully depleted (FD) thin film SOI (silicon-on-insulator) MOSFETs is presented and compared to the noise of partially depleted (PD) thin film MOSFETs. Noise measurements were performed on n+ polysilicon gate n-channel transistors fabricated on SIMOX substrates with a buried oxide thickness of 3500 Å. In the linear region, the FD transistor was found to exhibit a dependence on the front gate voltage whereas in the saturation region the noise was found to be independent of gate bias. The PD device, on the other hand, exhibited noise characteristics which were independent of gate bias in both regimes of operation. The linear region noise characteristics of the FD MOSFET exhibited a dependence on the front and back gate bias due to the increase of the front surface electric field and a corresponding increase in the fraction of inversion charge at the surface
Keywords
electron device noise; insulated gate field effect transistors; random noise; semiconductor device testing; semiconductor-insulator boundaries; SIMOX substrates; flicker noise; front gate voltage; front surface electric field; gate bias; linear regime; low-frequency noise behavior; polysilicon gate n-channel transistors; saturation regimes; surface inversion charge; thin film fully depleted SOI MOSFETs; 1f noise; Low-frequency noise; MOSFETs; Noise measurement; Performance evaluation; Semiconductor thin films; Silicon on insulator technology; Substrates; Transistors; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, 1991. Proceedings, 1991., IEEE International
Conference_Location
Vail Valley, CO
Print_ISBN
0-7803-0184-6
Type
conf
DOI
10.1109/SOI.1991.162841
Filename
162841
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