DocumentCode :
1889148
Title :
Stability investigation of high aspect ratio n-type silicon field emitter arrays
Author :
Bachmann, M. ; Dams, F. ; Dusberg, F. ; Hofmann, M. ; Pahlke, A. ; Langer, C. ; Lawrowski, R. ; Prommesberger, C. ; Schreiner, R.
Author_Institution :
R&D Detectors, KETEK GmbH, Munich, Germany
fYear :
2015
fDate :
13-17 July 2015
Firstpage :
204
Lastpage :
205
Abstract :
Electron sources based on silicon field emitter arrays, produced in processes based on semiconductor technology, are good candidates for a miniaturized X-ray source. A key parameter for this application is the stability of the X-ray photon flux and, thus, the emission current. In the present work we have investigated the influence of the residual gas pressure and a resistor in series on the emission stability of a high aspect ratio n-type silicon emitter array with hybrid extraction electrode. An increase of current fluctuations was found for pressures above 10-6 mbar. High resistances in series to the emitter array alter the emission characteristics, but greatly suppress spikes in the emission current and improve its stability. This, however, strongly depends on the bias point. The field enhancement factor is not affected by the resistance. In a long term measurement the emission current was found to be constant after an initial phase of degradation.
Keywords :
X-ray production; elemental semiconductors; field emitter arrays; particle beam stability; silicon; Si; X-ray photon flux stability; electron source; emission current; emission stability; high aspect ratio field emitter array; miniaturized X-ray source; residual gas pressure; semiconductor technology; Current measurement; Field emitter arrays; Resistance; Resistors; Silicon; Stability analysis; Thermal stability; XRF spectroscopy; emission current stability; field emitter array; semiconductor field emission; silicon tips;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2015 28th International
Conference_Location :
Guangzhou
Print_ISBN :
978-1-4673-9356-0
Type :
conf
DOI :
10.1109/IVNC.2015.7225584
Filename :
7225584
Link To Document :
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