DocumentCode :
1889159
Title :
Optical emission spectroscopy of high density metal plasma during magnetron sputtering
Author :
Hankins, O.E. ; Radzimski, Z.J.
Author_Institution :
Dept. of Nucl. Eng., North Carolina Univ., Raleigh, NC, USA
fYear :
1997
fDate :
19-22 May 1997
Firstpage :
237
Abstract :
Summary form only given. The ability to sputter deposit in the self-sustained mode without an inert gas indicates that a high ionization efficiency of the neutral target species has been achieved and that a purely metal ion plasma can be formed using magnetron source. In this paper, the mechanisms responsible for such effective ionization of copper sputtered from the target are investigated using optical emission spectroscopy. Light emission spectra were taken for various conditions of magnetron operation to understand the transition from standard to self-sputtering mode. We offer explanations on the factors which may be responsible for effective self-sputtering and ionization of.
Keywords :
ionisation; metals; plasma diagnostics; sputter etching; Cu; high density metal plasma; high ionization efficiency; inert gas; ionization; light emission spectra; magnetron source; magnetron sputtering; optical emission spectroscopy; purely metal ion plasma; self-sputtering; self-sustained mode; sputter deposition; Heating; Magnetic materials; Plasma density; Plasma materials processing; Plasma stability; Plasma waves; Resonance; Spectroscopy; Sputtering; Stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location :
San Diego, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-3990-8
Type :
conf
DOI :
10.1109/PLASMA.1997.604964
Filename :
604964
Link To Document :
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