• DocumentCode
    1889256
  • Title

    InP-based HEMT technologies toward 100 Gbit/s ICs

  • Author

    Enoki, Takatomo

  • Author_Institution
    NTT Photonics Labs., NIT Corp., Atsugi, Japan
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    439
  • Lastpage
    442
  • Abstract
    This paper describes HEMT IC technology developed at NTT for 50 Gbit/s ICs, which are the key components in 40 Gbit/s optical communications systems these days. We have successfully integrated state-of-the-art HEMTs and achieved stable operation of D-FFs at over 50 Gbit/s with high yield and uniformity. It also discusses the potential of the technology for achieving 100 Gbit/s-class ICs and clarifies the HEMT performance requirements. The target performance of HEMTs is a gm of over 1.4 S/mm with an fT of over 280 GHz. Scaling down of HEMTs and reducing their parasitic capacitance are the major issues in achieving 100 Gbit/s operations.
  • Keywords
    HEMT integrated circuits; III-V semiconductors; capacitance; circuit stability; field effect digital integrated circuits; high-speed integrated circuits; indium compounds; 1.4 S/mm; 280 GHz; 50 to 100 Gbit/s; D-type flip flops; InP; InP-based HEMT IC technology; NTT; monolithic integration; optical communications systems; parasitic capacitance reduction; stable operation; Data communication; Electron mobility; FETs; Frequency conversion; HEMTs; Indium gallium arsenide; Indium phosphide; Optical fiber communication; Parasitic capacitance; Photonic integrated circuits;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials Conference, 2002. IPRM. 14th
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-7320-0
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2002.1014462
  • Filename
    1014462