• DocumentCode
    1891126
  • Title

    Emission and absorption of optical phonons in multigate silicon nanowire MOSFETs

  • Author

    Dehdashti, N. ; Kranti, A. ; Ferain, I. ; Lee, C.-W. ; Yan, R. ; Razavi, P. ; Yu, R. ; Colinge, J.P.

  • Author_Institution
    Tyndall Nat. Inst., Univ. Coll. Cork, Cork, Ireland
  • fYear
    2010
  • fDate
    26-29 Oct. 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In this paper we study the effect of emission and absorption processes due to inelastic optical phonons in multigate silicon nanowire transistors. We show that low-energy optical phonons reduce drain current through both phonon emission/absorption processes while high-energy phonons redistribute current spectrum inside the nanowire merely by phonon emission process without reducing the current drive significantly. A three-dimensional quantum mechanical device simulator based on the NEGF formalism in uncoupled-mode space has been developed to model quantities of interest in the presence of electron-phonon interactions. Electron-phonon scattering is accounted for by adopting the self-consistent Born approximation and using the deformation potential theory.
  • Keywords
    MOSFET; electron-phonon interactions; elemental semiconductors; nanowires; semiconductor device models; semiconductor quantum wires; silicon; Si; deformation potential theory; drain current; electron-phonon interaction; electron-phonon scattering; high energy phonons; inelastic optical phonons; multigate silicon nanowire MOSFET; multigate silicon nanowire transistor; phonon emission/absorption process; self-consistent Born approximation; three-dimensional quantum mechanical device simulator; uncoupled-mode space; Absorption; Optical scattering; Phonons; Silicon; Stimulated emission; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computational Electronics (IWCE), 2010 14th International Workshop on
  • Conference_Location
    Pisa
  • Print_ISBN
    978-1-4244-9383-8
  • Type

    conf

  • DOI
    10.1109/IWCE.2010.5677915
  • Filename
    5677915