DocumentCode :
1891126
Title :
Emission and absorption of optical phonons in multigate silicon nanowire MOSFETs
Author :
Dehdashti, N. ; Kranti, A. ; Ferain, I. ; Lee, C.-W. ; Yan, R. ; Razavi, P. ; Yu, R. ; Colinge, J.P.
Author_Institution :
Tyndall Nat. Inst., Univ. Coll. Cork, Cork, Ireland
fYear :
2010
fDate :
26-29 Oct. 2010
Firstpage :
1
Lastpage :
4
Abstract :
In this paper we study the effect of emission and absorption processes due to inelastic optical phonons in multigate silicon nanowire transistors. We show that low-energy optical phonons reduce drain current through both phonon emission/absorption processes while high-energy phonons redistribute current spectrum inside the nanowire merely by phonon emission process without reducing the current drive significantly. A three-dimensional quantum mechanical device simulator based on the NEGF formalism in uncoupled-mode space has been developed to model quantities of interest in the presence of electron-phonon interactions. Electron-phonon scattering is accounted for by adopting the self-consistent Born approximation and using the deformation potential theory.
Keywords :
MOSFET; electron-phonon interactions; elemental semiconductors; nanowires; semiconductor device models; semiconductor quantum wires; silicon; Si; deformation potential theory; drain current; electron-phonon interaction; electron-phonon scattering; high energy phonons; inelastic optical phonons; multigate silicon nanowire MOSFET; multigate silicon nanowire transistor; phonon emission/absorption process; self-consistent Born approximation; three-dimensional quantum mechanical device simulator; uncoupled-mode space; Absorption; Optical scattering; Phonons; Silicon; Stimulated emission; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Computational Electronics (IWCE), 2010 14th International Workshop on
Conference_Location :
Pisa
Print_ISBN :
978-1-4244-9383-8
Type :
conf
DOI :
10.1109/IWCE.2010.5677915
Filename :
5677915
Link To Document :
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