Title :
A new step motion of polysilicon microstructures
Author :
Akiyama, Terunobu ; Shono, Katsufusa
Author_Institution :
Dept. of Electr. & Electron. Eng., Sophia Univ., Tokyo, Japan
Abstract :
Polysilicon sliders and rotors with a new step motion, which are fabricated on a silicon wafer by surface micromachine technology, are presented. The proportional relation between the velocity and the applied pulse frequency is experimentally confirmed. The coefficient in the relation is the step for an applied pulse, which is determined by the peak voltage of applied pulse, bushing height plate length, plate thickness etc
Keywords :
electron beam lithography; elemental semiconductors; masks; micromechanical devices; rotors; silicon; small electric machines; sputter etching; stepping motors; Si; Si wafer; applied pulse frequency; bushing height plate length; electron beam direct writing; elemental semiconductor; five-mask process; peak voltage; plasma etching; plate thickness; polysilicon microstructures; rotors; sliders; step motion; surface micromachine; Fabrication; Frequency; Insulators; Microstructure; Rails; Shafts; Silicon; Thermal decomposition; Voltage; Writing;
Conference_Titel :
Micro Electro Mechanical Systems, 1993, MEMS '93, Proceedings An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems. IEEE.
Conference_Location :
Fort Lauderdale, FL
Print_ISBN :
0-7803-0957-X
DOI :
10.1109/MEMSYS.1993.296910
