Title :
Impurity and phonon-limited electron mobilities in 〈110〉-oriented silicon nanowires
Author :
Niquet, Y.M. ; Persson, M. ; Mera, H. ; Zhang, Wensheng ; Delerue, Cristophe ; Allan, Gord ; Diarra, M. ; Wang, E.
Author_Institution :
INAC, UJF, Grenoble, France
Abstract :
We discuss impurity- and phonon-limited electron mobilities in (110)-oriented silicon nanowires. We show that (1) boron acceptors behave as tunnel barriers for the electrons, while phosphorous donors behave as quantum wells giving rise to Fano resonances in the transmission; (2) As a consequence, the room-temperature mobility is typically much larger in P-doped than in B-doped nanowires; (3) In particular, the mobility can be strongly hindered by acceptors in Si nanowires embedded in SiO2; (4) On the opposite, the impurity-limited mobility can increase with decreasing nanowire diameter in gate-all-around nanowires with high-K oxides, due to both the efficient screening of the impurity potential and band structure effects; and (5) the electron-phonon coupling is enhanced in small nanowires and is the dominant scattering mechanism at room temperature for impurity concentrations up to a few 1018 cm-3.
Keywords :
band structure; electron mobility; electron spin polarisation; electron-phonon interactions; elemental semiconductors; impurities; impurity scattering; nanowires; photoemission; semiconductor quantum wires; silicon; (110)-oriented silicon nanowires; B-doped nanowires; Fano resonances; P-doped nanowires; Si; band structure effects; boron acceptors; dominant scattering mechanism; efficient screening; electron-phonon coupling; gate-all-around nanowires; high-K oxides; impurity concentrations; impurity potential; impurity-limited electron mobilities; nanowire diameter; phonon-limited electron mobilities; phosphorous donors; quantum wells; temperature 293 K to 298 K; tunnel barriers; Electron mobility; Impurities; Logic gates; Nanowires; Phonons; Scattering; Silicon;
Conference_Titel :
Computational Electronics (IWCE), 2010 14th International Workshop on
Conference_Location :
Pisa
Print_ISBN :
978-1-4244-9383-8
DOI :
10.1109/IWCE.2010.5677929