DocumentCode
1891584
Title
A passive, in situ micro strain gauge
Author
Lin, Liwei ; Howe, Roger T. ; Pisano, Albert P.
Author_Institution
California Univ., Berkeley, CA, USA
fYear
1993
fDate
7-10 Feb 1993
Firstpage
201
Lastpage
206
Abstract
A passive micro strain gauge based on the strain magnification technique has been designed, demonstrated, and characterized. This strain gauge can be fabricated in situ along with active micro sensors or actuators on the same chip for monitoring residual strain effects. Both tensile or compressive strain could be easily observed under optical microscopes and the resolution of strains as small as 0.001% could be achieved. The residual strain study of RTA (rapid thermal annealing) polysilicon is reported
Keywords
electric sensing devices; micromechanical devices; strain gauges; MEMS; RTA; Si; compressive strain; in situ micro strain gauge; passive micro strain gauge; polysilicon; residual strain effects; strain magnification technique; tensile strain; Actuators; Capacitive sensors; Frequency measurement; Optical films; Residual stresses; Sensor phenomena and characterization; Strain measurement; Stress measurement; Tensile strain; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 1993, MEMS '93, Proceedings An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems. IEEE.
Conference_Location
Fort Lauderdale, FL
Print_ISBN
0-7803-0957-X
Type
conf
DOI
10.1109/MEMSYS.1993.296922
Filename
296922
Link To Document