Single-mask processing of micromechanical piercing structures using ion milling [biomedical tissue fasteners]

Author

Dizon, Roberto ; Han, Hongtao ; Reed, Michael L.

Author_Institution

Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA

fYear

1993

fDate

7-10 Feb 1993

Firstpage

48

Lastpage

52

Abstract

A useful method for transferring mask patterns over large distances using ion milling is described. This technique exploits the anisotropy of a collimated ion beam to etch the projection of a stencil mask pattern into a thin film. This method avoids the difficulties associated with photoresist processing on highly nonplanar substrates, and thus provides an alternative process avenue for the development of three-dimensional microstructures. The technique is demonstrated by fabricating arrays of high aspect ratio barbs, which are intended for use in tissue fasteners in biomedical applications

Keywords

biomedical equipment; joining processes; masks; micromechanical devices; sputter etching; Si; Si micromachining; arrays; biomedical applications; collimated ion beam anisotropy; high aspect ratio barbs; ion milling; micro-velcro; micromechanical piercing structures; single-mask processing; three-dimensional microstructures; tissue fasteners; transferring mask patterns; Anisotropic magnetoresistance; Collimators; Etching; Ion beams; Micromechanical devices; Microstructure; Milling; Resists; Substrates; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 1993, MEMS '93, Proceedings An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems. IEEE.

Conference_Location

Fort Lauderdale, FL

Print_ISBN

0-7803-0957-X

Type

conf

DOI

10.1109/MEMSYS.1993.296950

Filename

296950