DocumentCode
1892266
Title
Adaptive sampling for effective multi-layer defect monitoring
Author
Kuo, Vc Illiam W ; Akella, Ram ; Fletcher, David
Author_Institution
California Univ., Berkeley, CA, USA
fYear
1997
fDate
6-8 Oct 1997
Abstract
The main purpose of this paper is to provide an effective adaptive sampling strategy for defect monitoring in semiconductor manufacturing. The proposed sampling strategy varies the amount of sampling based on previous observations to achieve fast excursion detection or minimum yield loss due to excursions. This scheme will require the equal or less amount of inspection capacity than the traditional static sampling approach
Keywords
inspection; integrated circuit testing; integrated circuit yield; statistical process control; adaptive sampling strategy; chart based model; effective multilayer defect monitoring; fast excursion detection; inspection capacity; minimum yield loss; semiconductor manufacturing; statistical process control; Fabrication; Inspection; Laser feedback; Manufacturing industries; Manufacturing processes; Monitoring; Process control; Sampling methods; Semiconductor device manufacture; Semiconductor device modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on
Conference_Location
San Francisco, CA
Print_ISBN
0-7803-3752-2
Type
conf
DOI
10.1109/ISSM.1997.664521
Filename
664521
Link To Document