Title :
Adaptive sampling for effective multi-layer defect monitoring
Author :
Kuo, Vc Illiam W ; Akella, Ram ; Fletcher, David
Author_Institution :
California Univ., Berkeley, CA, USA
Abstract :
The main purpose of this paper is to provide an effective adaptive sampling strategy for defect monitoring in semiconductor manufacturing. The proposed sampling strategy varies the amount of sampling based on previous observations to achieve fast excursion detection or minimum yield loss due to excursions. This scheme will require the equal or less amount of inspection capacity than the traditional static sampling approach
Keywords :
inspection; integrated circuit testing; integrated circuit yield; statistical process control; adaptive sampling strategy; chart based model; effective multilayer defect monitoring; fast excursion detection; inspection capacity; minimum yield loss; semiconductor manufacturing; statistical process control; Fabrication; Inspection; Laser feedback; Manufacturing industries; Manufacturing processes; Monitoring; Process control; Sampling methods; Semiconductor device manufacture; Semiconductor device modeling;
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-3752-2
DOI :
10.1109/ISSM.1997.664521
