Title :
On the utility of run to run control in semiconductor manufacturing
Author :
Musacchio, John ; Rangan, Sundeep ; Spanos, Costas ; Poolla, Kameshwar
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
Abstract :
Run to Run (RTR) control uses data from past process runs to adjust settings for the next run. By making better use of existing in-line metrology and actuation capabilities, RTR control offers the potential of reducing variability in manufacturing with minimal capital cost. In this paper, we survey the types of equipment models that can be used for RTR control, compare existing RTR control algorithms, and discuss issues affecting the potential utility of RTR control
Keywords :
Kalman filters; adaptive control; cost optimal control; feedback; integrated circuit manufacture; moving average processes; robust control; statistical process control; Kalman filter methods; actuation capabilities; control algorithms; equipment models; exponentially weighted moving average; feedback control; in-line metrology; minimal capital cost; offset drift cancellation; optimality conditions; parameter adaptive control; past process runs; potential utility; reduced variability in manufacturing; robust control; run to run control; semiconductor manufacturing; statistical response surface; Costs; Fabrication; Feedback control; Integrated circuit modeling; Manufacturing; Metrology; Noise measurement; Process design; Semiconductor device manufacture; Semiconductor device modeling;
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-3752-2
DOI :
10.1109/ISSM.1997.664523
