• DocumentCode
    1893659
  • Title

    Proximity effects and VLSI design

  • Author

    Hook, Terence B. ; Brown, Jeff ; Tian, Xiaowei

  • Author_Institution
    IBM Microelectron., Essex Junction, VT, USA
  • fYear
    2005
  • fDate
    9-11 May 2005
  • Firstpage
    167
  • Lastpage
    170
  • Abstract
    The authors have presented the data illustrating several proximity effects - layout variations that affect transistor characteristics. Some of these proximity effects may be best avoided by layout groundrules (polysilicon doping, butted junction proximity). Others (well and halo proximity, isolation size) are accommodated by including the effect in the compact model. None of these effects is likely to be completely eliminated in principle, so designers should become familiar with the nature of these effects, and be prepared to take them into account in circuit layouts.
  • Keywords
    VLSI; circuit layout; integrated circuit design; proximity effect (lithography); VLSI design; circuit layouts; layout groundrules; layout variations; proximity effects; transistor characteristics; Circuit simulation; Doping; Implants; Isolation technology; Microelectronics; Proximity effect; Resists; Surface resistance; Threshold voltage; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Circuit Design and Technology, 2005. ICICDT 2005. 2005 International Conference on
  • Print_ISBN
    0-7803-9081-4
  • Type

    conf

  • DOI
    10.1109/ICICDT.2005.1502622
  • Filename
    1502622