DocumentCode :
1893659
Title :
Proximity effects and VLSI design
Author :
Hook, Terence B. ; Brown, Jeff ; Tian, Xiaowei
Author_Institution :
IBM Microelectron., Essex Junction, VT, USA
fYear :
2005
fDate :
9-11 May 2005
Firstpage :
167
Lastpage :
170
Abstract :
The authors have presented the data illustrating several proximity effects - layout variations that affect transistor characteristics. Some of these proximity effects may be best avoided by layout groundrules (polysilicon doping, butted junction proximity). Others (well and halo proximity, isolation size) are accommodated by including the effect in the compact model. None of these effects is likely to be completely eliminated in principle, so designers should become familiar with the nature of these effects, and be prepared to take them into account in circuit layouts.
Keywords :
VLSI; circuit layout; integrated circuit design; proximity effect (lithography); VLSI design; circuit layouts; layout groundrules; layout variations; proximity effects; transistor characteristics; Circuit simulation; Doping; Implants; Isolation technology; Microelectronics; Proximity effect; Resists; Surface resistance; Threshold voltage; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Circuit Design and Technology, 2005. ICICDT 2005. 2005 International Conference on
Print_ISBN :
0-7803-9081-4
Type :
conf
DOI :
10.1109/ICICDT.2005.1502622
Filename :
1502622
Link To Document :
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