Title :
Effect of base profiles on the forward transit time of the bipolar transistors in BiCMOS circuits
Author :
Yuan, Jiann-shiun ; Yeh, Chune-Sin ; Gadepally, Bhaskar
Author_Institution :
Dept. of Electr. Eng., Univ. of Central Florida, Orlando, FL, USA
Abstract :
The effect of the base doping profile on the base and the emitter transit time of bipolar transistors (BJTs) in BiCMOS circuits is presented. Comparing the uniform base profile with the exponential base profile in low injection, the uniform base profile gives a lower base transit time for a given base resistance and peak base concentration, while the exponential base profile gives a lower base transit time for a given base resistance and base width at a large base width. At high injection, the uniform base profile always gives the minimum base transit time. The uniform base doping profile is the optimal profile for BiCMOS logic at which the bipolar transistors are operated in high injection
Keywords :
BiCMOS integrated circuits; bipolar transistors; doping profiles; semiconductor device models; BJT; BiCMOS circuits; BiCMOS logic; base doping profile effect; base resistance; base transit time; base width; bipolar transistors; emitter transit time; forward transit time; optimal profile; BiCMOS integrated circuits; Bipolar transistors; Charge carrier processes; Current density; Doping profiles; Electron mobility; Logic devices; Nonuniform electric fields; Photonic band gap; Voltage;
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 1993., Proceedings of the Tenth Biennial
Conference_Location :
Research Triangle Park, NC
Print_ISBN :
0-7803-0990-1
DOI :
10.1109/UGIM.1993.297023